Quartz gold-plated crucible

Electric arc crucible

Quartz crucibles have the advantages of high purity, strong temperature resistance, large size, high accuracy, good insulation, energy conservation, and stable quality, and are increasingly widely used. The testing of quartz crucibles is a very important process, and the testing of quartz crucibles is developing towards on-site testing!

1. Quartz crucibles can be used at temperatures below 1450 degrees Celsius, divided into two types: transparent and opaque. The semi transparent quartz crucible using the arc method is an essential basic material for drawing large diameter monocrystalline silicon and developing large-scale integrated circuits. Today, developed countries in the world's semiconductor industry have replaced small transparent quartz crucibles with this crucible. It has advantages such as high purity, strong temperature resistance, large size, high accuracy, good insulation, energy conservation, and stable quality.

2. It cannot come into contact with HF and is prone to react with caustic soda and alkali metal carbonates at high temperatures.

3. The quartz crucible is suitable for melting samples with K2S2O7 and KHSO4 as fluxes, and treating samples with Na2S207 (first dried at 212 degrees) as fluxes.

4. Quartz is brittle and easy to break, so be careful when using it.

5. Except for HF, ordinary dilute inorganic acids can be used as cleaning fluids. The commonly used quartz crucibles for drawing monocrystalline silicon in China are 18 inches and 20 inches, and there are also manufacturers using crucibles of 22 inches and above. At present, the crucible technology produced by major domestic crucible manufacturers is relatively mature. The raw materials for its production are quartz sand imported from the United States and high-purity quartz sand from Norway. There are also small factories that use domestic materials to produce quartz crucibles, which have a certain impact on the stability of monocrystalline silicon during drawing.

At present, the coating technology for crucible production has been used by most manufacturers, that is, coating a layer of barium dioxide solution on the surface of the crucible dissolved in ordinary quartz sand to form a dense layer, which can prevent the reaction between silicon and quartz crucible during the high-temperature drawing of monocrystalline silicon and improve the crystallization rate.

The semi transparent quartz crucible using the arc method is an essential basic material for drawing large diameter monocrystalline silicon and developing large-scale integrated circuits. Today, developed countries in the world's semiconductor industry have replaced small transparent quartz crucibles with this crucible. It has advantages such as high purity, strong temperature resistance, large size, high accuracy, good insulation, energy conservation, and stable quality.